Materials Research and Development is an international, peer-reviewed open access journal dedicated to advancing research the field of materials science and engineering. The journal provides a rapid publication process to ensure wide dissemination of high-quality articles to scientists, professionals, and interested individuals worldwide. Our goal is to serve as an efficient, reliable, and trusted platform for scholars and readers, publishing cutting-edge research in the field.
Abstract: Using topology optimization and selective laser melting (SLM) 3D printing, lightweight AlSi10Mg pistons are designed and manufactured to enhance engine power output. A heat transfer/structural mechanical model is established, optimizing piston skirt, annular internal cooling oil passage, support structure, and evaluation of the printing process. Printing accuracy, microstructure, mechanical properties, and post-installation power output are analyzed. Results indicate a trapezoidal cross section, with the annular cold oil passage exhibiting superior heat resistance/load capacity. Vertex coordinates are (26.3,3), (28.3,3), (28.3,9), and (27.3,9). Volume reduced from 55359 mm3 to 46715 mm3. Pin hole and head lower end are supported, with maximum displacement at the upper end face corner of the skirt inner surface-head, 0.57 mm. Outer skirt surface displacement is 0.29 mm, while skirt upper end face displacement is minimal, 0.15 mm. Room temperature structure is primarily eutectic (α-Al+Si) with minor Al2Cu. Annealed at 300°C for 2 h, Young's modulus is 68.8 GPa, yield strength is 244.5 MPa, tensile strength is 366.6 GPa, fracture strain is 3%, Poisson's ratio is 0.31, and Vickers hardness is 1230.9 MPa. After installation, the maximum speed of the three-cylinder engine increases from 3710 RPM to 3920 RPM, and the maximum shaft horsepower increases from 100 BHP to 112 BHP.Abstract: Using topology optimization and selective laser melting (SLM) 3D printing, lightweight AlSi10Mg pistons are designed and manufactured to enhance engine power output. A heat transfer/structural mechanical model is established, optimizing piston skirt, annular internal cooling oil passage, support structure, and evaluation of the printing process. Pr...Learn More
Abstract: Nanoimprinting technology (NIL) has received widespread attention due to its high precision and high efficiency in the preparation of micro and nanostructures. The key to NIL lies in selecting photoresist materials, with positive and negative photoresists being the main choices. This article aims to comprehensively analyze the advantages and limitations of positive and negative photoresists in NIL, with a focus on performance comparison and scalability for large-scale production. By conducting in-depth research on their properties and applications, this study aims to provide new references for the selection criteria of photoresists in NIL processes. Both positive and negative photoresists have certain advantages and limitations in NIL. Positive photoresist has high resolution and low surface tension, making it suitable for preparing high-precision micro/nanostructures. However, the development process of photoresist is relatively complex, requiring the use of development solution and a longer development time. In addition, the adhesion of positive photoresist to negatively charged surfaces is poor, which may lead to mold detachment or damage. Negative photoresist has high contrast and short development time, making it suitable for large-scale production and high-throughput preparation. The development process of negative photoresist is relatively simple, requiring only the use of developing solution and a shorter development time. However, the resolution of negative photoresist is relatively low and not suitable for preparing high-precision micro/nanostructures. Meanwhile, the surface tension of negative photoresist is relatively high, which may cause the mold to detach or be damaged. This article selects suitable positive or negative photoresists based on their specific application requirements in terms of resolution, surface tension, complexity of development process, and production scale, in order to achieve the best microstructure preparation effect.Abstract: Nanoimprinting technology (NIL) has received widespread attention due to its high precision and high efficiency in the preparation of micro and nanostructures. The key to NIL lies in selecting photoresist materials, with positive and negative photoresists being the main choices. This article aims to comprehensively analyze the advantages and limita...Learn More
